Plasma Science & Technology (PS&T)

Plasma Science and Technology assists in advancing plasma science and technology by reporting important, novel, helpful and thought-provoking progress in this strongly multidisciplinary and interdisciplinary field, in a timely manner. We are aware of a fake version of the reputed journal Plasma Science and Technology which we publish in collaboration with the Hefei Institutes of Physical Science, Chinese Academy of Sciences (CASHIPS). We have taken steps to get the illegitimate site taken down and delisted from search indexes as quickly as possible.Plasma Science & Technology is a well-established international scientific journal dedicated to advancing research across all aspects of plasma physics and plasma technology. First launched in 1999, the journal publishes high-quality original research articles, reviews, brief communications and letters that explore both fundamental plasma science and applied technologies. Its subject coverage encompasses phenomena in low-temperature and high-temperature plasmas, experimental and theoretical plasma physics, diagnostic developments, modelling and simulation techniques, magnetically and inertially confined plasmas, space and astrophysical plasma phenomena, and practical applications of plasma science in engineering and industry.

Plasma Science & Technology (PS&T) is :-

• International, Peer-Reviewed, Open Access, Refereed, Condensed Matter Physics, basic plasma phenomena, plasma theory and modelling, magnetically confined plasma, inertially confined plasma, low temperature plasma, astrophysics and space plasma, plasma technology , Online or Print , Monthly Journal

• UGC Approved, ISSN Approved: P-ISSN P-ISSN: 1009-0630, E-ISSN: 2058-6272, Established: 1999, Impact Factor: 1.8
• Does Not Provide Crossref DOI

• Not indexed in Scopus, WoS, DOAJ, PubMed, UGC CARE