Functional Materials for (Opto)electronics, Sensors, Detectors, and Green Energy. Materials Science in Semiconductor Processing Mrovides a unique forum for the discussion of novel processing, applications, and theoretical studies of functional semiconductor materials and devices. Each issue aims to provide a snapshot of current insights, new achievements, breakthroughs, perspectives, and future trends in material sciences for such diverse fields as advanced electronics and opto-electronics, sensors and detectors, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film deposition and growth technology, hybrid and quantum materials, device fabrication technology, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography, etching, doping, annealing, and thin film processing for submicron and nano devices; material and device failure, reliability, damage evolution, and related issues; advanced chemical and physical vapor deposition; advanced metallization and interconnect schemes; compound semiconductor materials and processing; new dielectrics and non-oxide materials and their applications; (macro)molecular, hybrid, heterostructure, and quantum materials, devices, and processing; molecular dynamics, ab-initio methods, Monte Carlo simulations, data intensive and machine-learning based approaches, etc.; new materials and processes for discrete and integrated circuits; advanced electronic packaging materials and processes; magnetic materials and spintronics; crystal growth technology and mechanism; intrinsic impurities and defects of materials. Pure device simulation and modelling without connection to experiment is not within the aim and scope of this journal.

Materials Science in Semiconductor Processing (MSSP) is :

Materials Science in Semiconductor Processing (MSSP)

Journal Descriptions

Materials Science in Semiconductor Processing (MSSP) is :

International, Peer-Reviewed, Open Access, Refereed, Electronic Engineering, Optical Materials, Magnetic Materials , Online or Print, Monthly Journal

UGC Approved, ISSN Approved: P-ISSN - 1369-8001, E-ISSN - 1873-4081, Established in - 2024, Impact Factor - 4.2

Not Provide Crossref DOI

Indexed in Scopus, WoS

Not indexed in DOAJ, PubMed, UGC CARE

Indexing

Scopus

WoS

Elsevier

Science Direct

SJR

Index Copernicus

ISSN Portal

MIAR

Publications of MSSP

Syntheses and characterization of Syzygium aromaticum , Eletaria cardamomum and Cinnamomum verum modified TiO 2 and their biological applications

Investigation of fur-like residues post dry etching of polyimide using aluminum hard etch mask

Cu 2O nanosheets decorated CuMn O2 nanosphere electrodeposited on Cu foil as high -performance supercapacitor electrode

Establish Your Own Journal Without the Expense!

QUICKLINKS

CONTACT US