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Journal Photo for Journal of Vacuum Science & Technology A
Peer reviewed only Open Access

Journal of Vacuum Science & Technology A (JVST A)

Publisher : AVS: Science & Technology of Materials, Interfaces, and Processing
General Physics and Astronomy Vacuum technology and systems Surface analysis and surface chemistry
e-ISSN 1520-8559
p-ISSN 0734-2101
Issue Frequency Bi-Monthly
Impact Factor 2.1
Est. Year 1983
Mobile 9193612787
Language English
APC YES
Email aydil@nyu.edu

Journal Descriptions

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (JVST A) is a respected bimonthly peer-reviewed scientific journal launched in 1983 when the original Journal of Vacuum Science and Technology was divided into parts A and B to better serve distinct research communities. Published by AIP Publishing on behalf of the American Vacuum Society (AVS), JVST A serves as a major platform for high-quality research in vacuum science and surface/interface phenomena. The journal’s core mission is to advance understanding of thin films, surfaces, vacuum engineering and technology, and materials processing, both in fundamental science and in technological applications. JVST A regularly publishes original research articles, review papers, letters, and technical communications that contribute to fields such as surface analysis, plasma processing, thin film deposition, vacuum systems, interface chemistry, and electronic materials. Its interdisciplinary content attracts contributions from physicists, materials scientists, engineers, and technologists working on challenges ranging from nanostructured materials and devices to advanced fabrication techniques relevant to microelectronics, photonics, energy conversion, and more. The journal maintains rigorous peer review and editorial standards, ensuring that published work advances both scientific understanding and practical applications. Dr. Eray S. Aydil, as Editor-in-Chief, guides the editorial direction, supported by a strong editorial board.

Journal of Vacuum Science & Technology A (JVST A) is :-

  • International, Peer-Reviewed, Open Access, Refereed, General Physics and Astronomy, Vacuum technology and systems, Surface analysis and surface chemistry, Thin film deposition, etch, characterization, Plasma-surface interactions and plasma processing, Materials for microelectronics, photonics, energy applications, Nanostructured materials and devices , Online or Print , Bi-Monthly Journal

  • UGC Approved, ISSN Approved: P-ISSN P-ISSN: 0734-2101, E-ISSN: 1520-8559, Established: 1983, Impact Factor: 2.1
  • Does Not Provide Crossref DOI
  • Not indexed in Scopus, WoS, DOAJ, PubMed, UGC CARE

Indexing