Journal of Vacuum Science and Technology (JVST)

The Journal of Vacuum Science and Technology is a highly respected peer-reviewed scientific journal that publishes cutting-edge research in the fields of vacuum science, materials processing, and applied surface and interface phenomena. It is divided into two sections: JVST A focuses on microelectronics, nanometer-scale science, and fabrication technologies, while JVST B emphasizes beam sources, plasma processes, and vacuum technology applications. The journal serves as a key platform for researchers in physics, materials science, electrical engineering, and nanotechnology. It publishes original research articles, review papers, and technical reports that advance understanding of vacuum-based processes and device fabrication methods. Topics commonly include thin film deposition, etching techniques, surface characterization, semiconductor device development, and plasma-material interactions. JVST is widely indexed in major scientific databases and is considered a leading publication in applied vacuum and surface science research. It maintains strong international collaboration and is frequently cited in academic and industrial research.

Journal of Vacuum Science and Technology (JVST) is :-

• International, Peer-Reviewed, Open Access, Refereed, Vacuum science and technology, Thin films and nanostructures, Semiconductor processing, Surface science, Plasma science, Microelectronics fabrication, Materials engineering, materials science, electrical engineering, nanotechnology, thin film deposition, etching techniques, surface characterization, semiconductor device development, plasma-material interactions , Online , Bi-Monthly Journal

• UGC Approved, ISSN Approved: P-ISSN E-ISSN: 1672-7126, Established: 1996,
• Does Not Provide Crossref DOI

• Not indexed in Scopus, WoS, DOAJ, PubMed, UGC CARE