Back to Top

International Journal of Industrial Engineering: Theory, Applications and Practice (IJIE)

Publisher :

Pusan National University

Scopus Profile
Peer reviewed only
Scopus Profile
Open Access
  • Industrial Engineering
  • Data mining
e-ISSN :

1943-670X

Issue Frequency :

Quarterly

Impact Factor :

1.2

p-ISSN :

1072-4761

Est. Year :

1994

Mobile :

82515120311

Country :

Korea South

Language :

English

APC :

YES

Impact Factor Assignee :

Google Scholar

Email :

ijietap.office@pnu.edu

Journal Descriptions

The International Journal of Industrial Engineering: Theory, Applications and Practice publish original, quality articles reporting advances in industrial engineering theory, techniques, methodology, applications, and practice; general surveys and critical reviews; educational or training articles, including case studies; short communications; keynote papers; book reviews; announcements; etc., concerned with traditional aspects and recent advances in Industrial Engineering.


International Journal of Industrial Engineering: Theory, Applications and Practice (IJIE) is :

International, Peer-Reviewed, Open Access, Refereed, Industrial Engineering, Data mining , Online or Print, Quarterly Journal

UGC Approved, ISSN Approved: P-ISSN - 1072-4761, E-ISSN - 1943-670X, Established in - 1994, Impact Factor - 1.2

Not Provide Crossref DOI

Indexed in Scopus, WoS

Not indexed in DOAJ, PubMed, UGC CARE

Publications of IJIE

  • dott image October, 2018

MODELLING AND DECISION SUPPORT SYSTEM FOR INTELLIGENT MANUFACTURING: AN EMPIRICAL STUDY FOR FEEDFORWARD-FEEDBACK LEARNING-BASED RUN-TO-RUN CONTROLLER ...

This study aims to address the formation of various decision models based on modeling, analytics, and optimization techniques for intelligent manufacturing and smart production. Indeed, smar...

  • dott image January, 2018

Modelling and decision support system for intelligent manufacturing: An empirical study for feedforward-feedback learning-based run-to-run controller ...

Shrinkage in semiconductor devices affects the process window of all wafer fabrication steps including plasma etching. Drifts or shifts are most significant effects on the etching process du...

Establish Your Own Journal Without the Expense!

OJSCloud offers a complete, free setup to get you publishing.

Start Your Free Journal!
free profile