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Disturbance Rejection Run-to-Run Controller for Semiconductor Manufacturing

January, 1970

Journal Name:

DOI: 10.1007/978-3-030-25446-9_13 move

Issue: | Volume: | Page No: 301--319


This chapter introduces a framework of disturbance rejection controller for discrete-time Run-to-Run (R2R) control system in semiconductor manufacturing environments. While we discussed the source of uncertainty and disturbance in wafer fabrication process, the photolithography process as one of the cutting-edge steps in wafer fabrication is selected for illustrating the power of disturbance rejection algorithm for compensating the misalignment. Along with this case study, some classification of disturbance rejection control algorithm with the structure of control plant is discussed.